SEM – FEI Helios Nano Lab 650

Technical specifications

• High Resolution Field Emission (Schottky) Scanning Microscope (Dual Beam)
• Resolution of the electron beam:
  – 0.8 nm at 15 kV
  – 1.5 nm at 200 V
• Resolution of the ion beam:
  – 4.0 nm at 30 kV using preferred statistical method
  – 2.5 nm at 30 kV using selective edge method
• Maximum sample size: 150 mm in diameter, 55 mm in height
• Maximum sample weight: 500 g (incl. sample holder)

Detectors and micro analysis

• Elstar in-lens SE detector (TLD-SE)
• Elstar in-lens BSE detector (TLD-BSE)
• Everhart-Thornley SE detector (ETD)
• Energy Dispersive X-Ray Spectroscopy (EDX), Genesis & Team software

Typical applications and accessories

• Imaging, analysis, milling, patterning of specimens down to the nanoscale
• TEM lift out / TEM lamella
• Nanofabrication and micromanipulation
• Multiple gas injection system for Au-, Pt-, W-, C-, Co- and H20- deposition
• Correlative Microscopy (LM – SEM)
• Micromanipulator from Kleindiek
• Lift Out Shuttle from Kleindiek
• Eucentric five Axis Table from Kleindiek
• Micromanipulator OmniProbe 200

Location

Pharmazentrum, U1007